Improved thermal reliability in base contact of full 3-inch InP Double-HBTs with fT and fmax in excess of 300 GHz

  • Lee, In-geun; 
  • Jeon, Yong-soo; 
  • Kim, Yonghyun; 
  • Yun, Jacob; 
  • Kim, Ted; 
  • ... Kim, Daehyun; 
  • 외 4명
Citations

SCOPUS

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초록

In this paper, we have structurally and electrically examined the thermal degradation of platinum-based ohmic contacts for base layers of InP DHBTs. The results show that the degradation of the base contact is caused by the formation of an inhomogeneous Au-InGaAs alloy. It was also found that the contact resistance degradation could be effectively suppressed by inserting a molybdenum diffusion barrier. We demonstrate an InP DHBT on a 3-inch InP substrate via stepper-based photolithography with an improved base ohmic contact. The fabricated DHBTs (W<inf>E</inf> = 1.0 μm and L<inf>E</inf> = 15 μm) exhibit high current gain (β) = 57 at V<inf>CE</inf> = 1.0 V. Excellent f<inf>T</inf> of 331 GHz and f<inf>max</inf> of 310 GHz are obtained at J<inf>C</inf> = 3.2 mA/μm2 and V<inf>CE</inf> = 1.4 V. © 2024 International Conference on Compound Semiconductor Manufacturing Technology. All Rights Reserved.

키워드

Cut-off frequency (fT); Double heterojunction bipolar transistors (DHBTs); Indium phosphide (InP); maximum oscillation frequency (fmax); Thermal stress
제목
Improved thermal reliability in base contact of full 3-inch InP Double-HBTs with fT and fmax in excess of 300 GHz
저자
Lee, In-geun; Jeon, Yong-soo; Kim, Yonghyun; Yun, Jacob; Kim, Ted; Kwon, Hyukmin; Shin, Seungheon; Lee, Jaehak; Yang, Kyunghoon; Kim, Daehyun
발행일
2024
유형
Conference paper