2D plasmonic micro-square arrays based on innovative two-step pattern transfer and plasma treatment for high-efficiency Si solar cells

초록

Silicon (Si) photovoltaic cells and their production play a pivotal role in advancing energy utilization within the rapidly expanding solar industry, which serves as a critical driver in realizing global sustainability objectives and mitigating environmental repercussions associated with energy production. Here, we introduce a novel two-step pattern transfer technique to successfully imprint a two-dimensional plasmonic micro-square periodic array onto an Si substrate, utilizing Kapton® Tape and plasma technology. Remarkably, this represents the first-ever application of flexible and stretchable Kapton® polyimide for pattern transfer onto Si. The vacuum plasma treatment plays a pivotal role in significantly enhancing surface adhesion performance, thereby facilitating the efficient pattern transfer process. As a result, the resulting microstructure exhibits exceptional performance as a plamonic broadband absorber in the visible region, making it a highly promising candidate for enhancing efficiency in Si-based solar cells. To support our experimental findings, the finite-difference time domain method was employed for simulating the fabricated plasmonic structure and determining the electric field distribution. The simulation results unequivocally affirm the robust and intense light trapping capabilities of the microstructure. Moreover, our fabrication technique demonstrates the potential for achieving high-resolution microstructure through an innovative, straightforward, and cost-efficient approach. © The Author(s) 2024.

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