Wettability control of paper through substitution between the hydroxyl group and carbon elements using argon-carbon plasma treatment

  • Kim, Hong Tak; 
  • Jung, Sang Kooun; 
  • Kim, Dong-Eun; 
  • Park, Chung Youl; 
  • Lee, Sung-Youp
Citations

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SCOPUS

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초록

The surface of paper was treated to control wettability using argon-carbon plasma generated by a direct current-pulsed (frequency: 60 kHz) sputtering device with parallel-arrangement magnets. After plasma treatment, the C-C bond percentage in the C 1s region was inversely proportional to the C-OH bond percentage, while the ratio of C=O and O-C=O bonds only changed slightly. The change ratios for the increase in C-C and the decrease in the C-OH bonds were approximately the same, and the change ratio increased from approximately 5%-11% with an increase in the plasma current. The reduction ratio of the contact angle decreased from 0.945 to 0.182 (degrees/s) with increasing plasma current. These results indicate that the water resistance of the paper surface was enhanced after the simple plasma treatment, and wettability could be easily controlled by changing the substitution ratio between C-OH and C-C elements, achieved by altering the plasma current.

키워드

Carbon; Contact angle; Hydroxyl group; Paper; Plasma; Wettability
제목
Wettability control of paper through substitution between the hydroxyl group and carbon elements using argon-carbon plasma treatment
저자
Kim, Hong Tak; Jung, Sang Kooun; Kim, Dong-Eun; Park, Chung Youl; Lee, Sung-Youp
DOI
10.1016/j.vacuum.2022.111398
발행일
2022-11
유형
Article
저널명
Vacuum
권
205