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Analysis of Grain Boundary Effects Based on Location in a Diode-Type NAND Flash Memory Cell
- Kim, Jinsu;
- Kim, Hansol;
- Moon, Hojin;
- Song, Wonjun;
- Bae, Jong-Ho;
- ... Woo, Sung Yun;
- 외 1명
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1초록
In this paper, we investigate the variation in turn-on voltage (Von) depending on the grain boundary (GB) position within the cell during the read operation of diode-type NAND flash memory, which achieves an extremely steep subthreshold swing (SS) through a positive feedback (PF) mechanism. During the read operation, as the GB is positioned further from the center of the selected cell, it becomes less influenced by the gate bias. Depending on the presence of the electron barrier, holes and electrons are trapped at the GB, resulting in variation in the Von.
키워드
NAND flash memory; Positive feedback (PF); Polycrystalline Si (Poly-Si); Grain boundary (GB)
- 제목
- Analysis of Grain Boundary Effects Based on Location in a Diode-Type NAND Flash Memory Cell
- 저자
- Kim, Jinsu; Kim, Hansol; Moon, Hojin; Song, Wonjun; Bae, Jong-Ho; Choi, Nagyong; Woo, Sung Yun
- 발행일
- 2025
- 유형
- Proceedings Paper
- 저널명
- 2025 SILICON NANOELECTRONICS WORKSHOP, SNW
- 페이지
- 76 ~ 77
- 언어
- ENG
- 출판사
- IEEE
- 발행국가
- 미국
- 분량
- 2 페이지
- ISSN
- P 2161-4636