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Investigation of Row Hammer and Passing Gate Effects Based on the Work Functions of Dual Gates in DRAM Cells
- Kim, Hansol;
- Im, Jisung;
- Kim, Jinsu;
- Woo, Seungmin;
- Kwon, Taeseong;
- ... Woo, Sung Yun;
- 외 2명
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4초록
In this paper, the effect of the work function of the double metal gate inside DRAM cells on the row hammer (RHE) and passing gate effect (PGE) was analyzed. The RHE and PGE were observed to be significantly affected by the work function of the top metal, mainly due to the leakage current (GIDL). Additionally, it was found that the PGE of DRAM cells was also significantly affected by the work function of the bottom metal.
키워드
DRAM; BCAT; TCAD simulation; row hammer effect; passing gate effect
- 제목
- Investigation of Row Hammer and Passing Gate Effects Based on the Work Functions of Dual Gates in DRAM Cells
- 저자
- Kim, Hansol; Im, Jisung; Kim, Jinsu; Woo, Seungmin; Kwon, Taeseong; Yoon, Young Jun; Bae, Jong-Ho; Woo, Sung Yun
- 발행일
- 2024
- 유형
- Proceedings Paper
- 저널명
- 2024 IEEE SILICON NANOELECTRONICS WORKSHOP, SNW 2024
- 페이지
- 89 ~ 90
- 언어
- ENG
- 출판사
- IEEE
- 발행국가
- 미국
- 분량
- 2 페이지
- ISSN
- P 2161-4636