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Oligomeric amide formation in secondary organic aerosol from the photooxidation of aromatics in the presence of ammonia
- Dao, Pham Duy Quang;
- Lee, Seongweon;
- Ali, Ahsan;
- Park, Geondo;
- Kim, Sunghwan;
- ... Cho, Chan-sik;
- ... Lim, Ho-jin
SCOPUS
5초록
This study aims to enhance our understanding of the chemical composition and potential formation pathways of oligomeric amides in relation to the photooxidation of aromatic volatile organic compounds (VOCs) in atmospheric aerosol. Aromatic hydrocarbons (e.g., toluene, m-xylene, and ethylbenzene) undergo complex photooxidation processes that interact with NH<inf>3</inf>, leading to the formation of complex N-containing organic compounds. In this study, we successfully synthesized and characterized several oligomer amides, which were employed as standards to detect N-containing secondary organic aerosol (SOA) generated in a smog chamber under simulated atmospheric conditions. The results revealed the presence of oligomeric amides in the SOA, indicating their formation during the photooxidation process in the presence of NH<inf>3</inf> and providing significant insights related to the chemical formation pathway of SOA. © 2025 Elsevier B.V.
키워드
- 제목
- Oligomeric amide formation in secondary organic aerosol from the photooxidation of aromatics in the presence of ammonia
- 저자
- Dao, Pham Duy Quang; Lee, Seongweon; Ali, Ahsan; Park, Geondo; Kim, Sunghwan; Cho, Chan-sik; Lim, Ho-jin
- 발행일
- 2025-10-01
- 유형
- Article
- 권
- 997
- 언어
- ENG
- 출판사
- Elsevier B.V.
- 발행국가
- 네덜란드
- ISSN
- E 1879-1026
P 0048-9697